Low temperature atmospheric discharge
Plasma and interaction with surface
Plasma medicine
Nano metallic particle synthesis by spark discharge
Hard thin film deposition by sputtering
- Magnetron sputtering is such a powerful method based on physical vapor deposition in which accelerated ions in created plasma bombard the negatively charged electrode in order to eject the atoms from the target. These ejected atoms will be condensed on a substrate surface placed nearby to form thin films. Direct Current (DC), Radio Frequency (RF) power supplies and High-Power Impulse Magnetron Sputtering (HIPIMS) are three variations of magnetron sputtering used to deposit a wide range of metals and ceramics. The state of the art HIPIMS method, which utilizes high power densities, is currently used to deposit high dense thin films along adhesion enhancement.